A major objective of lithography in MEMS fabrication is to achieve: (i — PYQDeck

PyQdeckBEU PYQ Archive

Back to the 2026 paper

Module 3: Fabrication Techniques

20262m

A major objective of lithography in MEMS fabrication is to achieve:

(i) Controlled pattern definition
(ii) Fluid sterilization
(iii) Cell growth only
(iv) Mechanical packaging only

Search Google Ask AI

Worked SolutionAI Assisted

Answer: (i) Controlled pattern definition

Lithography fixes the size, shape and position of features, so later etching or deposition acts only where intended.

Similar questions

Bio MEMSThe primary purpose of photolithography in MEMS fabrication is to: (i) Increase the thickness of a substrate (ii) Remove all deposited material (iii) Transfer a pattern onto a substrate (iv) Measure fluid pressure20262m Bio MEMSDescribe the principle and process of photolithography used in MEMS fabrication.20267m Bio MEMSA microfluidic valve is primarily used to: (i) Control fluid flow (ii) Generate UV radiation (iii) Perform lithography (iv) Detect cell morphology20262m Bio MEMSMicrofluidic strategies for Lab-on-Chip systems may be used for: (i) Sample transport and processing (ii) Only external power generation (iii) Only mechanical packaging (iv) Only substrate polishing20262m

PreviousIn UV lithography, ultraviolet radiation is primarily used to: (i) Pattern a photosensitive material (ii) Pump fluid directly (iii) Concentrate biological cells (iv) Measure fluid pressure NextMicrofluidic strategies for Lab-on-Chip systems may be used for: (i) Sample transport and processing (ii) Only external power generation (iii) Only mechanical packaging (iv) Only substrate polishing

Budget AppAndroid App

Pocketly on Android

Log daily food, travel, and hostel expenses instantly. Set monthly spending limits and see where your money goes without complex spreadsheets.

Install Pocketly