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Module 1: MEMS Overview

20262m

The primary purpose of photolithography in MEMS fabrication is to:

(i) Increase the thickness of a substrate
(ii) Remove all deposited material
(iii) Transfer a pattern onto a substrate
(iv) Measure fluid pressure

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Answer: (iii) Transfer a pattern onto a substrate

Photolithography uses light to copy a mask pattern into a photosensitive resist layer. That resist then acts as a template for etching or deposition.

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